Surface Deposition & Analysis

Responsible: prof. Laura Borgese

Instrumentation

ATOMIC LAYER DEPOSITION (ALD)

Cambridge Nanotech Savannah 100

Atomic Layer Deposition provides conformal coating of metals, oxides and nitrides on all substrates. It is a great new tool for nanotechnology, microelectronics, MEMS, OLED, photonics, catalysts, fuel cells, biomedical and many other applications.

ALD MAIN PROSPECTS:

    • Precursors are saturatively chemisorbed =>stoichiometric films with large area uniformity and 3D conformality

    • Intrinsic deposition uniformity and small source size => easy scaling

    • Gentle low temperature deposition process for sensitive substrates

    • Further expansion of number of applied materials requires chemical synthesis.

Savannah 100 and 200 Technical specifications:

    • Substrate Size: up to 100 or 200 mm

    • Substrate Temperature: 25°C -400°C; ±0.2°C

    • Precursor Sources: 2, heated

    • Deposition Uniformity: <±1%

    • Footprint: 500 x 550 mm

    • Deposition: High speed/ultra high aspect ratio

    • Control: Labview-USB-PC

    • Vacuum Pump Integrated

    • Compatibility: CleanroomClass 100