Surface CHEMISTRY

Responsible: prof. Laura Borgese 

Instrumentation

ATOMIC LAYER DEPOSITION (ALD)

Cambridge Nanotech Savannah 100

Atomic Layer Deposition provides conformal coating of metals, oxides and nitrides on all substrates. It is a great new tool for nanotechnology, microelectronics, MEMS, OLED, photonics, catalysts, fuel cells, biomedical and many other applications.

ALD MAIN PROSPECTS:

• • Precursors are saturatively chemisorbed =>stoichiometric films with large area uniformity and 3D conformality

  • Intrinsic deposition uniformity and small source size => easy scaling

  • Gentle low temperature deposition process for sensitive substrates

  • Further expansion of number of applied materials requires chemical synthesis.

Savannah 100 and 200 Technical specifications:

• • Substrate Size: up to 100 or 200 mm

  • Substrate Temperature: 25°C -400°C; ±0.2°C

  • Precursor Sources: 2, heated

  • Deposition Uniformity: <±1%

  • Footprint: 500 x 550 mm

  • Deposition: High speed/ultra high aspect ratio

  • Control: Labview-USB-PC

  • Vacuum Pump Integrated

  • Compatibility: CleanroomClass 100