Responsible: dr. Laura Borgese

Instrumentation

ATOMIC LAYER DEPOSITION (ALD)

Cambridge Nanotech Savannah 100

 


Atomic Layer Deposition provides conformal coating of metals, oxides and nitrides on all substrates. It is a great new tool for nanotechnology, microelectronics, MEMS, OLED, photonics, catalysts, fuel cells, biomedical and many other applications.

ALD MAIN PROSPECTS:

  • Precursors are saturatively chemisorbed =>stoichiometric films with large area uniformity and 3D conformality
  • Intrinsic deposition uniformity and small source size => easy scaling
  • Gentle low temperature deposition process for sensitive substrates
  • Further expansion of number of applied materials requires chemical synthesis.

Savannah 100 and 200 Technical specifications:

  • Substrate Size: up to 100 or 200 mm
  • Substrate Temperature: 25°C -400°C; ±0.2°C
  • Precursor Sources: 2, heated
  • Deposition Uniformity: <±1%
  • Footprint: 500 x 550 mm
  • Deposition: High speed/ultra high aspect ratio
  • Control: Labview-USB-PC
  • Vacuum Pump Integrated
  • Compatibility: CleanroomClass 100